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Optimising ALD High-k Oxides for Novel Applications

Author: Dr Harm Knoops

Published: 17 Jul 2024 · Last updated: 17 Jul 2024

Dr Uwe Schroeder and Dr Harm Knoops will discuss the ALD of ferroelectric HfO2 for novel memory applications and the tuning properties of TiO2 and HfO2 by substrate biasing during Plasma ALD.

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