OI Academy: Maximize performance of GaN power electronics and increase consistency, quality, and longevity of devices

This webinar will be conducted in Korean

2:00pm Korea/Japan | 1:00pm Singapore/Taiwan | 3:00pm Sydney | 5:00pm New Zealand

Oi Academy | Webinar
Maximize Performance of Gan Power Electronics and Increase Consistency, Quality, and Longevity of Devices

The presentation is conducted in Chinese.

Plasma technology is used in the fabrication of most semiconductor devices created today across a wide range of industries. It is able to provide unique solutions for the creation and manipulation of matter with atomic-scale accuracy. The related applications for such technology could be:

• Power Devices
• Quantum Technology
• RF Devices
• VCSELs (Vertical-Cavity Surface-Emitting Lasers)

What you’ll learn:

• Atomic Layer Deposition and Atomic Layer Etching technologies for GaN HEMT power electronics manufacturing
• What is an automatic endpoint detector and how does it work?
• Optimal processing with automatic endpoint detector
• Case studies

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